finishing-and-treatment-manufacturing-processes > Physical Vapour Deposition (PVD)

Physical Vapour Deposition (PVD) involves the vapourisation of a material, which then condensates on the surface of the intended substrate.

The vapour may join with injected gases to form compounds, such as metallic or ceramic compounds.

There are many variations of the process, with various vacuum levels at which the process is undertaken, and multiple methods to turn the coating material into vapour. All variations of the PVD process are encompassed in the category.

Coatings Applied Using PVD can:
• Increase Hardness
• Reduce Friction
• Reduce Wear (Including Erosion)
• Increase Corrosion Resistance
• Increase Chemical Resistance

Unlike Chemical Vapour Deposition, the surface chemistry of the substrate (the component to be coated) doesn’t change - the coating is applied through the physical action of condensation.

Example of Coatings Applied by PVD:
• Titanium Nitride (TiN) - Improved Wear Resistance
• Titanium Aluminium Nitride (TiAlN) - Improved Wear Resistance & Hardness
• Zirconium Nitride (ZrN) -Improved Corrosion Resistance, Lubricity & Hardness
• Chromium Nitride (CrN) - Improved Corrosion Resistance, Wear Resistance, Hardness, Lubricity & Temperature Resistance