finishing-and-treatment-manufacturing-processes > Chemical Vapour Deposition (CVD)

Chemical Vapour Deposition (CVD) involves the introduction of a vapour into a controlled gaseous atmosphere, in which the component to be coated is heated. The reaction between the vapour, the gaseous atmosphere and the surface of the material to be coated forms the desired compound whilst forming a chemical bond with the surface.

This process category covers the formation of metallic, ceramic, carbon, polymeric or other compounds.

There are variations of the process, with various methods and levels of heating applied to the substrate including Plasma Enhanced CVD. All variations of the CVD process are encompassed in the category.

Chemical Vapour Deposition can be used to apply the same compounds as Physical Vapour Deposition, and more. The resultant coating thickness of CVD is greater than that typically applied in PVD.

Example of Coatings Applied by CVD:
• Titanium Nitride (TiN) - Improved Wear Resistance
• Titanium Aluminium Nitride (TiAlN) - Improved Wear Resistance & Hardness
• Zirconium Nitride (ZrN) -Improved Corrosion Resistance, Lubricity & Hardness
• Chromium Nitride (CrN) - Improved Corrosion Resistance, Wear Resistance, Hardness, Lubricity & Temperature Resistance
• Tantalum Carbide (TaC) - Improved Chemical Resistance, Wear Resistance, Lubricity & Temperature Resistance.
• Diamond-Like-Coating (DLC) - Greatly Improved Wear Resistance, Hardness & lubricity